, the Rooney Family Associate Professor of Engineering at the University of 91吃瓜, has been selected to receive the 2018 Institute of Electrical and Electronics Engineers (IEEE) .
The award, which recognizes outstanding technical contributions to the fields of nuclear and plasma science and includes an honorarium, plaque and certificate, will be presented at the 2018 International Conference on Plasma Science in Denver聽in June. 聽
Cited by the NPSS 鈥渇or contributions to the understanding of discharges and plasmas at microscale dimensions, the interaction between microdischarges and electron emission and the nature of electron transfer at plasma-liquid interfaces,鈥� Go explores a wide variety of topics in low-temperature plasma generation and chemistry, focusing on fundamental processes in microscale plasmas, plasma-liquid systems and plasma-enhanced catalysis. His work has important implications in applications ranging from chemical processing and fuel reforming to water purification and energy conversion.
Go directs the and is a concurrent faculty member in 91吃瓜鈥檚 Department of . In addition to this latest award, he has also received the inaugural 2015 Electrochemical Society Toyota Young Investigator Fellowship, the 2013 NSF Early Career Development Award and the 2011 AFOSR Young Investigator Research Award.
The co-owner of several patents, Go is a Fellow of the American Society of Mechanical Engineers. He is also a member of the American Association for the Advancement of Science, American Physical Society, Electrostatics Society of America and the IEEE.
A graduate of 91吃瓜, earning his bachelor鈥檚 degree in mechanical engineering in 2001, Go earned a master鈥檚 degree in 2004 in aerospace engineering from the University of Cincinnati聽and a doctorate in mechanical engineering in 2008 from Purdue University. He joined the 91吃瓜 faculty in 2008.
Originally published by at on March 16.